{"product_id":"tokyo-electron-tel-1d10-201588-12-upper-electrode-p-drm2-1z048aa-58812","title":"TOKYO ELECTRON TEL 1D10-201588-12 UPPER ELECTRODE, P, (DRM2), 1Z048AA-58812","description":"\u003cp\u003eThe \u003cstrong\u003eTOKYO ELECTRON (TEL) 1D10-201588-12 Upper Electrode (DRM2)\u003c\/strong\u003e is a critical \u003cstrong\u003eplasma process chamber component\u003c\/strong\u003e used in \u003cstrong\u003eTEL Unity \/ DRM2 etch and deposition systems\u003c\/strong\u003e. \u003cspan class=\"\"\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003ePositioned at the top of the process chamber, the upper electrode works in conjunction with the lower electrode (ESC) to \u003cstrong\u003egenerate and sustain plasma\u003c\/strong\u003e. It plays a key role in \u003cstrong\u003eRF power coupling, plasma uniformity, and process stability\u003c\/strong\u003e, directly impacting etch or deposition performance.\u003c\/p\u003e\n\u003cp\u003eThis version is typically supplied as an \u003cstrong\u003e“Upper Electrode with Monitor”\u003c\/strong\u003e, indicating integrated capability for \u003cstrong\u003eprocess sensing or endpoint monitoring\u003c\/strong\u003e, improving process control and repeatability. \u003cspan class=\"\"\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp\u003eConstructed from \u003cstrong\u003ehigh-purity materials (e.g., aluminum with coatings, silicon, or ceramic inserts depending on configuration)\u003c\/strong\u003e, the electrode is designed to withstand \u003cstrong\u003ehigh ताप, ion bombardment, and reactive plasma environments\u003c\/strong\u003e.\u003c\/p\u003e","brand":"83TECH PTE LTD","offers":[{"title":"Default Title","offer_id":44829365043293,"sku":null,"price":0.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0746\/5422\/0381\/files\/20-2.jpg?v=1785390848","url":"https:\/\/83techsg.com\/products\/tokyo-electron-tel-1d10-201588-12-upper-electrode-p-drm2-1z048aa-58812","provider":"83TECH PTE LTD","version":"1.0","type":"link"}