TOKYO ELECTRON TEL 1D10-201588-12 UPPER ELECTRODE, P, (DRM2), 1Z048AA-58812

The TOKYO ELECTRON (TEL) 1D10-201588-12 Upper Electrode (DRM2) is a critical plasma process chamber component used in TEL Unity / DRM2 etch and deposition systems.

Positioned at the top of the process chamber, the upper electrode works in conjunction with the lower electrode (ESC) to generate and sustain plasma. It plays a key role in RF power coupling, plasma uniformity, and process stability, directly impacting etch or deposition performance.

This version is typically supplied as an “Upper Electrode with Monitor”, indicating integrated capability for process sensing or endpoint monitoring, improving process control and repeatability.

Constructed from high-purity materials (e.g., aluminum with coatings, silicon, or ceramic inserts depending on configuration), the electrode is designed to withstand high ताप, ion bombardment, and reactive plasma environments.