SMC EM500-020T Filter Element, 20 µm, Stainless Steel
Mattson Technology 062-000002-00 Rev. 03 STANDOFF-HEATER
CZA0810 2B Viton Drain Valve
Mattson Technology SE-037742-N1 Process Chamber Component (Old P/N: 2MSNOV-0014)
DISCO Corporation Wheel IF, P/N 303200035419
Tokyo Electron (TEL) Water Cooling Flange, P/N 111020531411
Axcelis Technologies 17126830 Chamber Shell Plate
Steag RTP Systems Back Radiant Silicon Ring for High Temperature Processes – 200 mm
Tokyo Electron (TEL) 1D10-301638-13 Focus Ring
Mattson Technology 199-60001-00 Grid, Triode
Tokyo Electron (TEL) 1D10-201082-12 Upper Electrode 10
Heraeus Shin-Etsu Quartz Singapore 1105-100935-12 Quartz Wafer Boat / Furnace Carrier Assembly
Toshiba Ceramics TPSS High Purity Silicon Carbide CU-BOAT-E.V Wafer Boat
Seiko Seiki STP-300H Turbo Pump
STP-300 / TURBOMOLECULAR PUMP CONTROL UNIT, SCU-300 / SEIKO SEIKI
TYLAN GENERAL AdapTorr AC-2 Throttle Valve Controller
Applied Materials (AMAT) 0021-10223 LINER,CHAMBER,CLAMP LID
2ERTG-0003 / 2ERTG-002E, JAPAN ENERGY CORPORATION
High-purity Silicon Carbide (SiC) Ceramic, Toshiba Ceramics Co., Ltd.
MANIFOLD COVER 1105-200660-13
ALD-GE-1021A PROCESS CHAMBER, WELDMENT, IRIDIA-DL, 05-3606
TEL Tokyo Electron CU300L5Z2B (TELS) Thyristor Circuit Board
QUARTZ PEDESTAL 1105-300886-13
Mattson 58900085 Quartz Plate 8-Zone Heater Holder (Liner, Ver.2)
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5BB08203P DRM Plate Baffle Y2003 Coated Semiconductor Equipment Part
5BB08204P DRM Cover Bellows – Y₂O₃ Coated / Anodized Semiconductor Equipment Component
716-011493-001 / SPACER, QTZ, 284-303MM / LAM RESEARCH
716-018614-081 Focus Ring 21534651 Lam Research Corporation